Angular distribution of hybridization in sputtered carbon thin film
Y. Liu,
H. Wang,
Z. C. Wei
Affiliations
Y. Liu
Department of Physics, Capital Normal University, Beijing Key Laboratory of Metamaterials and Devices, Key Laboratory of Terahertz Optoelectronics, Ministry of Education, and Beijing Advanced Innovation Center for Imaging Technology, Beijing 100048, P.R. China
H. Wang
Department of Physics, Capital Normal University, Beijing Key Laboratory of Metamaterials and Devices, Key Laboratory of Terahertz Optoelectronics, Ministry of Education, and Beijing Advanced Innovation Center for Imaging Technology, Beijing 100048, P.R. China
Z. C. Wei
Department of Physics, Capital Normal University, Beijing Key Laboratory of Metamaterials and Devices, Key Laboratory of Terahertz Optoelectronics, Ministry of Education, and Beijing Advanced Innovation Center for Imaging Technology, Beijing 100048, P.R. China
The sp3/sp2 ratio of sputtered carbon thin film depends on the ion bombardment process and tailors the physical properties of carbon thin film. In present work, we report the angular distribution of hybridization in magnetron sputtered carbon thin film for the first time. By x-ray photoelectron spectra analyses, it is found that the sp3/sp2 ratio increases linearly with increasing the deposition angle from 0 to 90 degree, which could be attributed to the enhancement of direct knocking-out of near-surface target atoms. In addition, we also derive the sp3/sp2 ratio by simulation on complex permittivity in terahertz frequency using a modified percolation approximation tunneling model. Those derived data consist with the results from x-ray photoelectron spectroscopy.
