Semiempirical Two-Dimensional Model of the Bipolar Resistive Switching Process in Si-NCs/SiO<sub>2</sub> Multilayers
Juan Ramirez-Rios,
Karla Esther González-Flores,
José Juan Avilés-Bravo,
Sergio Alfonso Pérez-García,
Javier Flores-Méndez,
Mario Moreno-Moreno,
Alfredo Morales-Sánchez
Affiliations
Juan Ramirez-Rios
Electronics Department, Instituto Nacional de Astrofísica, Óptica y Electrónica, San Andrés Cholula 72840, Puebla, Mexico
Karla Esther González-Flores
Electronics Department, Instituto Nacional de Astrofísica, Óptica y Electrónica, San Andrés Cholula 72840, Puebla, Mexico
José Juan Avilés-Bravo
Electronics Department, Instituto Nacional de Astrofísica, Óptica y Electrónica, San Andrés Cholula 72840, Puebla, Mexico
Sergio Alfonso Pérez-García
Centro de Investigación en Materiales Avanzados S.C., Unidad Monterrey, Parque de Investigación e Innovación Tecnológica (PIIT), Apodaca 66628, Nuevo León, Mexico
Javier Flores-Méndez
Tecnológico Nacional de México/I.T. Puebla-División de Estudios de Posgrado e Investigación, Av. Tecnológico No. 420, Maravillas 72220, Puebla, Mexico
Mario Moreno-Moreno
Electronics Department, Instituto Nacional de Astrofísica, Óptica y Electrónica, San Andrés Cholula 72840, Puebla, Mexico
Alfredo Morales-Sánchez
Electronics Department, Instituto Nacional de Astrofísica, Óptica y Electrónica, San Andrés Cholula 72840, Puebla, Mexico
In this work, the SET and RESET processes of bipolar resistive switching memories with silicon nanocrystals (Si-NCs) embedded in an oxide matrix is simulated by a stochastic model. This model is based on the estimation of two-dimensional oxygen vacancy configurations and their relationship with the resistive state. The simulation data are compared with the experimental current-voltage data of Si-NCs/SiO2 multilayer-based memristor devices. Devices with 1 and 3 Si-NCs/SiO2 bilayers were analyzed. The Si-NCs are assumed as agglomerates of fixed oxygen vacancies, which promote the formation of conductive filaments (CFs) through the multilayer according to the simulations. In fact, an intermediate resistive state was observed in the forming process (experimental and simulated) of the 3-BL device, which is explained by the preferential generation of oxygen vacancies in the sites that form the complete CFs, through Si-NCs.