The usage of resonance optical absorption method for measurement of Cu atoms during the plasma sputtering deposition

Abstract

In this paper, the resonance optical absorption method, is used to measure the Cu atoms number density in different power levels of power supply. Atoms are sputtered from a Cu target during plasma magnetron sputtering deposition. For the light source, a commercial Cu hollow cathode lamp is used. For measurement of gas temperature, a small percentage of N2 is added to the gas mixture and the gas temperature is found by optical emission technique.

Keywords

• resonance optical absorption
• plasma sputtering