Computers in Human Behavior Reports (Dec 2024)

Technostress or reaction to techno-stressors? Validation of bilingual techno-stressors index (TSI-II) and a second-order formative model of techno-distress among Canadian legal professionals

  • Nathalie Cadieux,
  • Audrée Bethsa Camille,
  • Jean Cadieux,
  • Marie-Michelle Gouin,
  • Éveline Morin,
  • Pierre-Luc Fournier

Journal volume & issue
Vol. 16
p. 100485

Abstract

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Technostress is a phenomenon that needs to be seen as a process rather than a result. This requires the adaptation of measurement tools accordingly. Legal professionals are particularly exposed to technostress. This paper presents the validation of the TSI-II, an updated and bilingual version of the Techno-Stressors Index (TSI). This updated instrument was tested (French-n = 35; English-n = 30) and then retested (Overall-n = 4482; FR-n1 = 544; ENG-n2 = 3938) in both languages among Canadian legal professionals. Using the TSI-II, this paper proposes a second-order formative model of techno-distress, including seven techno-stressors, which captures the recent developments associated with the evolution of the technostress literature. Following the best practices for scale development, TSI-II presents excellent properties and is a good predictor of perceived stress among legal professionals. This validation aligns with developments in technostress literature, namely, the conceptual evolution of techno-distress as a component of the technostress process.

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