Laser-Inscribed Stress-Induced Birefringence of Sapphire
Hua Fan,
Meguya Ryu,
Reo Honda,
Junko Morikawa,
Zhen-Ze Li,
Lei Wang,
Jovan Maksimovic,
Saulius Juodkazis,
Qi-Dai Chen,
Hong-Bo Sun
Affiliations
Hua Fan
State Key Laboratory of Integrated Optoeletronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
Meguya Ryu
School of Materials and Chemical Technology, Tokyo Institute of Technology, Meguro-ku, Tokyo 152-8550, Japan
Reo Honda
School of Materials and Chemical Technology, Tokyo Institute of Technology, Meguro-ku, Tokyo 152-8550, Japan
Junko Morikawa
School of Materials and Chemical Technology, Tokyo Institute of Technology, Meguro-ku, Tokyo 152-8550, Japan
Zhen-Ze Li
State Key Laboratory of Integrated Optoeletronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
Lei Wang
State Key Laboratory of Integrated Optoeletronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
Jovan Maksimovic
Centre for Micro-Photonics, Faculty of Science, Engineering and Technology, Swinburne University of Technology, Hawthorn, VIC 3122, Australia
Saulius Juodkazis
Tokyo Tech World Research Hub Initiative (WRHI), School of Materials and Chemical Technology, Tokyo Institute of Technology, 2-12-1, Ookayama, Meguro-ku, Tokyo 152-8550, Japan
Qi-Dai Chen
State Key Laboratory of Integrated Optoeletronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
Hong-Bo Sun
State Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instrument, Tsinghua University, Beijing 100084, China
Birefringence of 3 × 10 − 3 is demonstrated inside cross-sectional regions of 100 μ m, inscribed by axially stretched Bessel-beam-like fs-laser pulses along the c-axis inside sapphire. A high birefringence and retardance of λ / 4 at mid-visible spectral range (green) can be achieved using stretched beams with axial extension of 30−40 μ m. Chosen conditions of laser-writing ensure that there are no formations of self-organized nano-gratings. This method can be adopted for creation of polarization optical elements and fabrication of spatially varying birefringent patterns for optical vortex generation.