Features of the formation of an array of isolated polymer P(VDF-TrFE) nanoparticles in pores of a periodic nanostructured silicon oxide membrane

Abstract

This work is devoted to the technological features of creating an array of pyroelectric nanoparticles placed in the pores of a silicon oxide membrane, ensuring their thermal insulation both from each other and from the supporting substrate. Mechanisms of anodic oxidation of the Al/Ti/SiO2 structure, ensuring the self-organization of a nanostructured oxide mask with specified geometric parameters, have been established. It has been shown that from a certain thickness of the adhesion layer, overgrowing of the open areas of the mask with titanium oxide nanoparticles does not occur. The regularities of the method of local ion etching of multilayer structures are determined, which ensures control of the depth of the formed pores by controlling the ion current. A correlation has been established between the lateral size of the cavities in silicon and the aspect ratio of aluminum oxide pores. The possibility of forming a silicon oxide membrane with pyroelectric polymer nanoparticles embedded in its pores has been demonstrated.

Keywords

• polymeric ferroelectric
• porous silicon oxide
• ion-beam etching
• ir – photodetector
• porous anodic alumina
• micromembrane
• anisotropic etching