Sputtering parameters effect on microstructural parameters of TiN coating via the Williamson-Hall analysis

Jinghao Huang; Shuliang Zou; Weiwei Xiao; Xiaoshuang Liu; Dewen Tang

doi:10.1088/2053-1591/abbd09

Materials Research Express (Jan 2020)

Sputtering parameters effect on microstructural parameters of TiN coating via the Williamson-Hall analysis

Jinghao Huang,
Shuliang Zou,
Weiwei Xiao,
Xiaoshuang Liu,
Dewen Tang

Affiliations

Jinghao Huang: School of Resource Environment and Safety Engineering, University of South China , Hengyang, Hunan 421001, People’s Republic of China; Hunan Provincial Key Laboratory of Emergency Safety Technology and Equipment for Nuclear Facilities, University of South China , Hengyang, Hunan 421001, People’s Republic of China
Shuliang Zou: School of Resource Environment and Safety Engineering, University of South China , Hengyang, Hunan 421001, People’s Republic of China; Hunan Provincial Key Laboratory of Emergency Safety Technology and Equipment for Nuclear Facilities, University of South China , Hengyang, Hunan 421001, People’s Republic of China
Weiwei Xiao: ORCiD; Hunan Provincial Key Laboratory of Emergency Safety Technology and Equipment for Nuclear Facilities, University of South China , Hengyang, Hunan 421001, People’s Republic of China; School of Mechanical Engineering, University of South China , Hengyang, Hunan 421001, People’s Republic of China
Xiaoshuang Liu: Hunan Provincial Key Laboratory of Emergency Safety Technology and Equipment for Nuclear Facilities, University of South China , Hengyang, Hunan 421001, People’s Republic of China; School of Mechanical Engineering, University of South China , Hengyang, Hunan 421001, People’s Republic of China
Dewen Tang: Hunan Provincial Key Laboratory of Emergency Safety Technology and Equipment for Nuclear Facilities, University of South China , Hengyang, Hunan 421001, People’s Republic of China; School of Mechanical Engineering, University of South China , Hengyang, Hunan 421001, People’s Republic of China

DOI: https://doi.org/10.1088/2053-1591/abbd09
Journal volume & issue: Vol. 7, no. 10
p. 106402

Abstract

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Titanium nitride (TiN) coatings were deposited on Zr-4 substrate by direct current magnetron sputtering. The microstructural property of the as-deposited coating was studied by means of x-ray diffraction (XRD). The microstructural parameters, such as crystal size, lattice strain, lattice deformation stress and lattice deformation energy density, were investigated in detail by employed modified Debye–Scherrer method (MDS) and Williamson-Hall methods by assuming three models namely uniform deformation model, uniform stress deformation model and uniform energy density deformation model. And the effects of sputtering power, substrate temperature and substrate bias on microstructural parameters were investigated. The results show that TiN coating deposited by magnetron sputtering presents lattice compressive strain, except for sample X3 - 1 which is prepared by substrate bias of −50 V. It is also shown that sputtering power, substrate temperature and substrate bias have great influence on crystal size, lattice strain, lattice deformation stress and lattice deformation energy density of the as-deposited TiN coating. Especially the influence of substrate bias is very significant.

Published in Materials Research Express

ISSN: 2053-1591 (Online)
Publisher: IOP Publishing
Country of publisher: United Kingdom
LCC subjects: Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials; Technology: Chemical technology
Website: https://iopscience.iop.org/journal/2053-1591

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