Broadband all-silicon hybrid plasmonic TM-pass polarizer using bend waveguides

Abstract

A complementary–metal–oxide semiconductor (CMOS) compatible all-silicon TM-pass polarizer using plasmonic bends is proposed. To simplify the fabrication and be compatible with the CMOS process, we employ only two materials: silicon and silicon dioxide. Highly doped silicon is used to support the plasmons. We obtain an extinction ratio and an insertion loss of 45.4 and 1.7 dB, respectively, at 1550 nm and a maximum extinction ratio of 58 dB. This is the highest reported extinction ratio for a TM-pass polarizer to the best of our knowledge. Furthermore, we achieved >20 dB of extinction ratio and <2 dB of insertion loss over 72 nm bandwidth for a device footprint <8.8 × 5.4 μm2. To achieve this, we exploit the properties of tight bends in plasmonic waveguides. Another advantage of the device is that it is robust against fabrication variations.