Materials Research Express (Jan 2020)

The influence of excessive H2 during barrier growth on InGaN light-emitting diodes

  • Yangfeng Li,
  • Shen Yan,
  • Die Junhui,
  • Xiaotao Hu,
  • Yimeng Song,
  • Zhen Deng,
  • Chunhua Du,
  • Wenqi Wang,
  • Ziguang Ma,
  • Lu Wang,
  • Haiqiang Jia,
  • Wenxin Wang,
  • Junming Zhou,
  • Yang Jiang,
  • Hong Chen

DOI
https://doi.org/10.1088/2053-1591/abc18f
Journal volume & issue
Vol. 7, no. 10
p. 105907

Abstract

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The influence of excessive H _2 flow during barrier growth on optical and electrical properties of InGaN light-emitting diodes (LEDs) are investigated in this study. The room temperature photoluminescence of LEDs decays with excessive H _2 treatment. Temperature-dependent photoluminescence (TDPL) reveals an increase of the density and a decrease of the activation energy of deep non-radiative recombination centers in the H _2 treated LEDs. The external quantum efficiency (EQE) of the LEDs suffers from excessive H _2 treatment. The leakage current on the reverse and forward sides of the LEDs are reduced significantly when treated with H _2 , which may be due to the suppressed Poole–Frenkel effect.

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