Analysis of Surface Texturing of Silicon with Surface Regular Microstructure Using C Method

Abstract

Silicon, as the most abundant element in the earth’s crust and the most common material used in electronic and optical equipment, has attracted the attention of many individuals to change the properties of this material, improving its electronic and optical properties. One of these efforts relies on the reduction of surface reflection by making use of different methods. However, among them, the use of lasers in creating surface microstructures has been of special importance because there is no need for masks and other additional materials. In this work, a theoretical method is utilized to analyze these textures with the theorem of diffraction grating on a micrometer scale. The surface reflection of the microstructure created by excimer laser exposure on a silicon surface is simulated. The theoretical Coordinate transformation method (C method) gives out notable results against the experimental records by approximating triangular and trapezoidal microstructures. The model is useful for predicting the reflective response of the modified microstructural morphology. One of the main applications is the texturing of the solar cell front faces to enhance their efficiency, mainly due to photon trapping.

Keywords

• surface microstructure
• silicon
• excimer laser
• grating
• C method