Inorganics (Feb 2024)

Bipolar Plasticity in Synaptic Transistors: Utilizing HfSe<sub>2</sub> Channel with Direct-Contact HfO<sub>2</sub> Gate Dielectrics

  • Jie Lu,
  • Zeyang Xiang,
  • Kexiang Wang,
  • Mengrui Shi,
  • Liuxuan Wu,
  • Fuyu Yan,
  • Ranping Li,
  • Zixuan Wang,
  • Huilin Jin,
  • Ran Jiang

DOI
https://doi.org/10.3390/inorganics12020060
Journal volume & issue
Vol. 12, no. 2
p. 60

Abstract

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The investigation of dual-mode synaptic plasticity was conducted in thin-film transistors (TFTs) featuring an HfSe2 channel, coupled with an oxygen-deficient (OD)-HfO2 layer structure. In these transistors, the application of negative gate pulses resulted in a notable increase in the post-synaptic current, while positive pulses led to a decrease. This distinctive response can be attributed to the dynamic interplay of charge interactions, significantly influenced by the ferroelectric characteristics of the OD-HfO2 layer. The findings from this study highlight the capability of this particular TFT configuration in closely mirroring the intricate functionalities of biological neurons, paving the way for advancements in bio-inspired computing technologies.

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