Jet formation and penetration performance of a double-layer charge liner with chemically-deposited tungsten as the inner liner

Abstract

This paper proposes a type of double-layer charge liner fabricated using chemical vapor deposition (CVD) that has tungsten as its inner liner. The feasibility of this design was evaluated through penetration tests. Double-layer charge liners were fabricated by using CVD to deposit tungsten layers on the inner surfaces of pure T2 copper liners. The microstructures of the tungsten layers were analyzed using a scanning electron microscope (SEM). The feasibility analysis was carried out by pulsed X-rays, slug-retrieval test and static penetration tests. The shaped charge jet forming and penetration law of inner tungsten-coated double-layer liner were studied by numerical simulation method. The results showed that the double-layer liners could form well-shaped jets. The errors between the X-ray test results and the numerical results were within 11.07%. A slug-retrieval test was found that the retrieved slug was similar to a numerically simulated slug. Compared with the traditional pure copper shaped charge jet, the penetration depth of the double-layer shaped charge liner increased by 11.4% and >10.8% respectively. In summary, the test results are good, and the numerical simulation is in good agreement with the test, which verified the feasibility of using the CVD method to fabricate double-layer charge liners with a high-density and high-strength refractory metal as the inner liner.

Keywords

• Shaped charge
• Chemical vapor deposition
• Tungsten
• Double-layer charge liner
• X-ray
• Penetration