High Power Laser Science and Engineering (Jan 2024)

A 172 mJ, high-energy picosecond 355 nm ultraviolet laser system at 100 Hz

  • Jiatong Li,
  • Jiayu Zhang,
  • Tiejun Ma,
  • Yongping Yao,
  • Runze Liang,
  • Xue Zhou,
  • Chunyan Jia,
  • Shengjun Huang,
  • Hongkun Nie,
  • Bo Yao,
  • Jingliang He,
  • Baitao Zhang

DOI
https://doi.org/10.1017/hpl.2024.52
Journal volume & issue
Vol. 12

Abstract

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A high-energy picosecond 355 nm ultraviolet (UV) laser operating at 100 Hz was demonstrated. A 352 mJ, 69 ps, 1064 nm laser at 100 Hz was realized firstly by cascaded regenerative, laser diode end-pumped single-pass and side-pumped main amplifiers. The stimulated Raman scattering-based beam shaping technique, thermally induced birefringence compensation and 4f spatial filter-image relaying systems were used to maintain a relatively homogeneous beam intensity distribution during the amplification process. By using lithium triborate crystals for second- and third-harmonic generation (THG), a 172 mJ, approximately 56 ps, 355 nm UV laser was achieved with a THG conversion efficiency of 49%. To the best of our knowledge, it is the highest pulse energy of a picosecond 355 nm UV laser so far. The beam quality factor ${M}^2$ and pulse energy stability were ${M}_x^2$ =3.92, ${M}_y^2$ =3.71 and root mean square of 1.48%@3 hours. This laser system could play significant roles in applications including photoconductive switch excitation, laser drilling and laser micro-fabrication.

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