Investigation of Inkjet-Printed Masks for Fast and Easy Photolithographic NIL Masters Manufacturing

Abstract

Modern optical systems often require small, optically effective structures that have to be manufactured both precisely and cost-effectively. One option to do this is using nanoimprint lithography (NIL), in which the optical structures are replicated as masters using a stamping process. It would also be advantageous to manufacture the master structures quickly and easily. A master manufacturing process based on a photolithographic image of an inkjet-printed mask is presented and investigated in this paper. An essential element is that a deliberate blurring of the printed structure edge of the mask is used in the photolithographic process. Combined with the use of a non-linear photoresist, this allows for improved edge geometries of the master structure. We discuss the inkjet-printed photomask, the custom photolithography system to prevent imaging of the printing dot roughness and the manufacturing processes of NIL polymer masks as well as their subsequent stamp imprinting. Finally, it was shown that stamp geometries with a width of 1.7 µm could be realised using inkjet-printed photomasks in the master manufacturing process. This methodology opens up the potential of fast and simple master manufacturing for the development and manufacturing of optical elements.

Keywords

• nanoimprint lithography
• photolithography
• inkjet
• photomask
• master manufacturing