RESEARCH OF STRUCTURE AND COMPOSITION OF FILMS SOLID SOLUTION (SIC)1-X (ALN)X, RECEIVED BY METHOD MAGNETRON DEPOSITION

Abstract

Method of magnetron sputtering targets polycrystalline SiC-AlN on substrates SiC and Al2O3 thin films received solid solutions (SiC)1-x(AlN)x. The methods of Xray and electron microscopy studies the structure and composition of films. There are factors that determine the composition and structure of films, as well as conditions for the formation of monocrystalline films of (SiC)1-x(AlN)x to the substrate SiC. The basic technological parameters of process magnetron sedimentation of films (SiC)1-x(AlN)x are calculated.

Keywords

• silicon carbide
• solid solutions
• synthesizing technology of films (sic)1-x(aln)x