AIP Advances (Sep 2019)

V-shaped dislocations in a GaN epitaxial layer on GaN substrate

  • Atsushi Tanaka,
  • Kentaro Nagamatsu,
  • Shigeyoshi Usami,
  • Maki Kushimoto,
  • Manato Deki,
  • Shugo Nitta,
  • Yoshio Honda,
  • Michal Bockowski,
  • Hiroshi Amano

DOI
https://doi.org/10.1063/1.5114866
Journal volume & issue
Vol. 9, no. 9
pp. 095002 – 095002-4

Abstract

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In this study, V-shaped dislocations in a GaN epitaxial layer on a free-standing GaN substrate were observed. Our investigation further revealed that the V-shaped dislocations were newly generated at the interface in the epilayer rather than propagated from the GaN substrate. V-shaped dislocations consist of two straight parts. The straight parts of the V-shaped dislocations were separated from each other in the m-direction and tilted toward the step-flow direction of the GaN epitaxial layer. The V-shaped dislocations are continuous single dislocations having a Burgers vector component of 1a and an intrinsic stacking fault between their straight parts.