EPJ Web of Conferences (Jan 2023)

Aluminum nitride on insulator: Material and processing optimization for integrated photonic applications

  • Spettel Jasmin,
  • Andrianov Nikolai,
  • Dubois Florian,
  • Furci Hernán,
  • Cassese Tommaso,
  • Liffredo Marco,
  • Villanueva Guillermo,
  • Quack Niels,
  • Moridi Mohssen,
  • Dao Thang Duy

DOI
https://doi.org/10.1051/epjconf/202328701004
Journal volume & issue
Vol. 287
p. 01004

Abstract

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Thin film aluminum nitride on insulator (AlNOI) has gained attention as a promising material platform for integrated photonic circuits (PICs) due to its ability to operate over a wide spectral range covering the ultra-violet to mid-infrared regions, while enabling a broad range of passive photonic functionalities. This study aims to optimize sputtered AlNOI films for PICs, with an emphasis on the spectroscopic ellipsometry study over a range from 0.19 µm to 25 µm. Furthermore, we discuss our approach for fabricating AlNOI PICs components, with a particular focus on optimizing the etching process to attain smooth sidewall waveguides.