Quantitative evaluation of the improvement of B2O3 for the melting and fining process of high aluminium silicate glass batches under reduced atmospheric pressure

Abstract

The cover glass for thin-film transistor liquid crystal display (TFT-LCD) panel is the high aluminum silicate glass. Compared with the conventional soda lime glass, its higher viscosity of glass liquid brought more difficulties in the melting and fining process of mass production. For better fining performance, some oxides that can reduce the viscosity are necessary. In this paper, the fining properties of high aluminum glass batches with and without B2O3 were investigated by CeO2 agent under reduced atmospheric pressure of 1000 mbar, 500 mbar, and 300 mbar. Area Fraction, mean bubble size, number of bubbles and the ascending velocity of bubbles were analyzed quantitatively by high-temperature observation (HTO) system in the fining process. The results showed that B2O3 could efficiently promote the melting and fining process.

Keywords

• area fraction
• mean bubble size
• number of bubbles
• ascending velocity of bubbles
• high temperature observation