AIP Advances (Sep 2018)

Epitaxial GaAs and pHEMT on aluminum-transformed AlAs nanofilms

  • Chia-Chu Cheng,
  • Chu-Chun Wu,
  • Yen-Ting Fan,
  • Jenq-Shinn Wu,
  • Sheng-Di Lin

DOI
https://doi.org/10.1063/1.5040382
Journal volume & issue
Vol. 8, no. 9
pp. 095029 – 095029-6

Abstract

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Heterogeneous epitaxial growth between semiconductors and metals boosts novel device development and enables various applications. In this work, we have investigated the epitaxial growth of GaAs layers on top of a nanoscale aluminium-transformed AlAs film. The grown GaAs layers are single-crystalline and of high-quality, that has been evidenced by using various material characterization methods and by fabricating their high-electron mobility transistors. We found that an intriguing process named as “arsenidation” of aluminium film plays a key role in the successful epitaxy. Our work opens a window for growing semiconductor/metal hetero-structures for various device applications in the future.