AIP Advances (Sep 2018)

Finite growth of InGaN/GaN triple-quantum-well microdisks on LiAlO2 substrate

  • Cheng-Da Tsai,
  • Ikai Lo,
  • Ying-Chieh Wang,
  • Chen-Chi Yang,
  • Shuo-Ting You,
  • Hong-Yi Yang,
  • Hui-Chun Huang,
  • Mitch M. C. Chou

DOI
https://doi.org/10.1063/1.5041883
Journal volume & issue
Vol. 8, no. 9
pp. 095208 – 095208-8

Abstract

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We have grown high-quality InxGa1-xN/GaN triple-quantum-well microdisks on LiAlO2 substrate by plasma-assisted molecular beam epitaxy. The InxGa1-xN/GaN microdisk with a hexagonal shape of oblique face 28o-angle off c-axis was achieved. The mechanism of the termination of awl-shaped growth and the growth rates of GaN-barrier and InxGa1-xN-well were evaluated and confirmed with the triple quantum wells. Based on the growth rates and 28o-angle geometric shape, one can control the finite size of InGaN/GaN microdisks by plasma-assisted molecular beam epitaxy.