The Effect of Obliquely Sputtered Cu Underlayers with Different Thicknesses on the Magnetic Properties of 50 nm Ni80Fe20 Thin Films

Xiaoyu Li; Yunshi Jiang; Huan Yan; Tianming Li; Lu Zhang; Zhihong Zhang; Xian Guan; Min Chen; Jiaoyin Wang; Yihan Pu; Genzhai Peng; Mengjia Wang

doi:10.3390/magnetochemistry8100134

Magnetochemistry (Oct 2022)

The Effect of Obliquely Sputtered Cu Underlayers with Different Thicknesses on the Magnetic Properties of 50 nm Ni80Fe20 Thin Films

Xiaoyu Li,
Yunshi Jiang,
Huan Yan,
Tianming Li,
Lu Zhang,
Zhihong Zhang,
Xian Guan,
Min Chen,
Jiaoyin Wang,
Yihan Pu,
Genzhai Peng,
Mengjia Wang

Affiliations

Xiaoyu Li: The Ninth Research Institute of China Electronics Technology Group, Mianyang 621000, China
Yunshi Jiang: The Ninth Research Institute of China Electronics Technology Group, Mianyang 621000, China
Huan Yan: The Ninth Research Institute of China Electronics Technology Group, Mianyang 621000, China
Tianming Li: High-Power Radiation Laboratory, School of Electronic Science and engineering, University of Electronic Science and Technology of China, Chengdu 610051, China
Lu Zhang: The Ninth Research Institute of China Electronics Technology Group, Mianyang 621000, China
Zhihong Zhang: The Ninth Research Institute of China Electronics Technology Group, Mianyang 621000, China
Xian Guan: Mianyang West Magnetic Technology Co, Ltd., Mianyang 621000, China
Min Chen: The Ninth Research Institute of China Electronics Technology Group, Mianyang 621000, China
Jiaoyin Wang: High-Power Radiation Laboratory, School of Electronic Science and engineering, University of Electronic Science and Technology of China, Chengdu 610051, China
Yihan Pu: The Ninth Research Institute of China Electronics Technology Group, Mianyang 621000, China
Genzhai Peng: The Ninth Research Institute of China Electronics Technology Group, Mianyang 621000, China
Mengjia Wang: The Ninth Research Institute of China Electronics Technology Group, Mianyang 621000, China

DOI: https://doi.org/10.3390/magnetochemistry8100134
Journal volume & issue: Vol. 8, no. 10
p. 134

Abstract

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The magnetic properties of 50 nm Ni80Fe20 deposited on Cu underlayers with different thicknesses by obliquely sputtering were studied. It was found that the in-plane uniaxial magnetic anisotropy (IPUMA) of the Ni80Fe20 film can be induced by the obliquely sputtered Cu underlayer deposited under the NiFe layer. The IPUMA field of NiFe film varies between 20 Oe and 40 Oe when the thickness of Cu underlayer varies from 5 nm to 50 nm. The permeability spectrum results show that the damping factor increases with increasing Cu underlayer thickness. This indicates that changing the thickness of the Cu underlayer of obliquely sputtering is an effective method to adjust the damping factor in the dynamic magnetization process of Ni80Fe20 thin films.

Published in Magnetochemistry

ISSN: 2312-7481 (Online)
Publisher: MDPI AG
Country of publisher: Switzerland
LCC subjects: Science: Chemistry
Website: http://www.mdpi.com/journal/magnetochemistry

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