APL Materials (Sep 2015)

Epitaxial growth of high quality WO3 thin films

  • X. Leng,
  • J. Pereiro,
  • J. Strle,
  • A. T. Bollinger,
  • I. Božović

DOI
https://doi.org/10.1063/1.4930214
Journal volume & issue
Vol. 3, no. 9
pp. 096102 – 096102-5

Abstract

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We have grown epitaxial WO3 films on various single-crystal substrates using radio frequency magnetron sputtering. While pronounced surface roughness is observed in films grown on LaSrAlO4 substrates, films grown on Y AlO3 substrates show atomically flat surfaces, as demonstrated by atomic force microscopy and X-ray diffraction (XRD) measurements. The crystalline structure has been confirmed to be monoclinic by symmetric and skew-symmetric XRD. The dependence of the growth modes and the surface morphology on the lattice mismatch are discussed.