Simulation of the Nucleation and Crystal Growth Process in the Laser-Induced Deposition in Solution by a Lattice Boltzmann Method

Abstract

A Lattice Boltzmann model is proposed, combining the theories of nucleation and crystal growth for the study of the laser-induced deposition in solution (LIDS). The conjugate heat transfer and the natural convection of the liquid precursor were simulated with the evolving interface of crystal growth. In turn, the morphology of the deposited materials was affected by multiple process parameters, including conditions of chemical precursor and the laser-induced heat and mass transfer. Simulation results indicated that the morphology of deposited materials was mostly affected by the initial concentration of the precursor solution. Specifically, the nonuniformity of thin films was caused by the convection induced by the pulsed-laser, and the surface roughness was due to the competition of local structures for the precursor supply. A relationship of process-condition-material was established, providing guidance of choosing various parameters in LIDS for a desirable morphology of deposited material, facilitating the capabilities of pulsed lasers in precise control in nanomanufacturing.

Keywords

• laser-induced deposition in solution (LIDS)
• morphology control
• process-condition-material relationship
• pulsed laser
• nucleation and crystal growth
• lattice boltzmann method (LBM)