Black Phosphorus Field-Effect Transistors with Improved Contact via Localized Joule Heating
Fangyuan Shi,
Shengguang Gao,
Qichao Li,
Yanming Zhang,
Teng Zhang,
Zhiyan He,
Kunchan Wang,
Xiaowo Ye,
Jichao Liu,
Shenghao Jiang,
Changxin Chen
Affiliations
Fangyuan Shi
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Key Laboratory for Thin Film and Microfabrication of Ministry of Education, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China
Shengguang Gao
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Key Laboratory for Thin Film and Microfabrication of Ministry of Education, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China
Qichao Li
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Key Laboratory for Thin Film and Microfabrication of Ministry of Education, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China
Yanming Zhang
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Key Laboratory for Thin Film and Microfabrication of Ministry of Education, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China
Teng Zhang
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Key Laboratory for Thin Film and Microfabrication of Ministry of Education, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China
Zhiyan He
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Key Laboratory for Thin Film and Microfabrication of Ministry of Education, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China
Kunchan Wang
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Key Laboratory for Thin Film and Microfabrication of Ministry of Education, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China
Xiaowo Ye
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Key Laboratory for Thin Film and Microfabrication of Ministry of Education, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China
Jichao Liu
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Key Laboratory for Thin Film and Microfabrication of Ministry of Education, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China
Shenghao Jiang
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Key Laboratory for Thin Film and Microfabrication of Ministry of Education, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China
Changxin Chen
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Key Laboratory for Thin Film and Microfabrication of Ministry of Education, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China
Two-dimensional (2D) black phosphorus (BP) is considered an ideal building block for field-effect transistors (FETs) owing to its unique structure and intriguing properties. To achieve high-performance BP-FETs, it is essential to establish a reliable and low-resistance contact between the BP and the electrodes. In this study, we employed a localized Joule heating method to improve the contact between the 2D BP and gold electrodes, resulting in enhanced BP-FET performance. Upon applying a sufficiently large source–drain voltage, the zero-bias conductance of the device increased by approximately five orders of magnitude, and the linearity of the current–voltage curves was also enhanced. This contact improvement can be attributed to the formation of gold phosphide at the interface of the BP and the gold electrodes owing to current-generated localized Joule heat. The fabricated BP-FET demonstrated a high on/off ratio of 4850 and an on-state conductance per unit channel width of 1.25 μS μm−1, significantly surpassing those of the BP-FETs without electrical annealing. These findings offer a method to achieve a low-resistance BP/metal contact for developing high-performance BP-based electronic devices.
