APL Materials (Aug 2019)

Progressive amorphization of GeSbTe phase-change material under electron beam irradiation

  • Ting-Ting Jiang,
  • Jiang-Jing Wang,
  • Lu Lu,
  • Chuan-Sheng Ma,
  • Dan-Li Zhang,
  • Feng Rao,
  • Chun-Lin Jia,
  • Wei Zhang

DOI
https://doi.org/10.1063/1.5102075
Journal volume & issue
Vol. 7, no. 8
pp. 081121 – 081121-5

Abstract

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Fast and reversible phase transitions in chalcogenide phase-change materials (PCMs), in particular, Ge-Sb-Te compounds, are not only of fundamental interests but also make PCMs based random access memory a leading candidate for nonvolatile memory and neuromorphic computing devices. To RESET the memory cell, crystalline Ge-Sb-Te has to undergo phase transitions first to a liquid state and then to an amorphous state, corresponding to an abrupt change in electrical resistance. In this work, we demonstrate a progressive amorphization process in GeSb2Te4 thin films under electron beam irradiation on a transmission electron microscope (TEM). Melting is shown to be completely absent by the in situ TEM experiments. The progressive amorphization process resembles closely the cumulative crystallization process that accompanies a continuous change in electrical resistance. Our work suggests that if displacement forces can be implemented properly, it should be possible to emulate symmetric neuronal dynamics by using PCMs.