APL Materials (May 2020)

A laser-ARPES study of LaNiO3 thin films grown by sputter deposition

  • Edoardo Cappelli,
  • Willem O. Tromp,
  • Siobhan McKeown Walker,
  • Anna Tamai,
  • Marta Gibert,
  • Felix Baumberger,
  • Flavio Y. Bruno

DOI
https://doi.org/10.1063/1.5143316
Journal volume & issue
Vol. 8, no. 5
pp. 051102 – 051102-6

Abstract

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Thin films of the correlated transition-metal oxide LaNiO3 undergo a metal–insulator transition when their thickness is reduced to a few unit cells. Here, we use angle-resolved photoemission spectroscopy to study the evolution of the electronic structure across this transition in a series of epitaxial LaNiO3 films of thicknesses ranging from 19 u.c. to 2 u.c. grown in situ by RF magnetron sputtering. Our data show a strong reduction in the electronic mean free path as the thickness is reduced below 5 u.c. This prevents the system from becoming electronically two-dimensional, as confirmed by the largely unchanged Fermi surface seen in our experiments. In the insulating state, we observe a strong suppression of the coherent quasiparticle peak, but no clear gap. These features resemble previous observations of the insulating state of NdNiO3.