High Temperature Materials and Processes (Jan 1999)

Structural Study of Thin Amorphous SiO2 and Si3N4 Films by the Grazing Incidence X-Ray Scattering (GIXS) Method

  • Sato, Shigeo,
  • Kakiuchi, Ryoji,
  • Yoshiya, Masato,
  • Matsubara, Eiichiro,
  • Saito, Masatoshi,
  • Waseda, Yoshio,
  • Takayama, Shinji

DOI
https://doi.org/10.1515/HTMP.1999.18.1-2.99
Journal volume & issue
Vol. 18, no. 1-2
pp. 99 – 107

Abstract

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