Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information Huazhong University of Science and Technology Wuhan the People's Republic of China
Shuaicheng Lu
Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information Huazhong University of Science and Technology Wuhan the People's Republic of China
Jing Liu
Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information Huazhong University of Science and Technology Wuhan the People's Republic of China
Bing Xia
Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information Huazhong University of Science and Technology Wuhan the People's Republic of China
Gaoyuan Yang
School of Physics and Electronic Engineering Hubei University of Arts and Science Xiangyang the People's Republic of China
Mo Ke
School of Integrated Circuits Huazhong University of Science and Technology Wuhan the People's Republic of China
Xuezhi Zhao
Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information Huazhong University of Science and Technology Wuhan the People's Republic of China
Junrui Yang
Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information Huazhong University of Science and Technology Wuhan the People's Republic of China
Yuxuan Liu
Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information Huazhong University of Science and Technology Wuhan the People's Republic of China
Ciyu Ge
Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information Huazhong University of Science and Technology Wuhan the People's Republic of China
Guijie Liang
School of Physics and Electronic Engineering Hubei University of Arts and Science Xiangyang the People's Republic of China
Wei Chen
School of Engineering Physics Shenzhen Technology University Shenzhen the People's Republic of China
Xinzheng Lan
Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information Huazhong University of Science and Technology Wuhan the People's Republic of China
Jianbing Zhang
Wenzhou Advanced Manufacturing Technology Institute Huazhong University of Science and Technology Wenzhou the People's Republic of China
Liang Gao
Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information Huazhong University of Science and Technology Wuhan the People's Republic of China
Jiang Tang
Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information Huazhong University of Science and Technology Wuhan the People's Republic of China
Abstract Lead sulfide (PbS) colloidal quantum dot (CQD) photodiodes integrated with silicon‐based readout integrated circuits (ROICs) offer a promising solution for the next‐generation short‐wave infrared (SWIR) imaging technology. Despite their potential, large‐size CQD photodiodes pose a challenge due to high dark currents resulting from surface states on non‐passivated (100) facets and trap states generated by CQD fusion. In this work, we present a novel approach to address this issue by introducing double‐ended ligands that supplementally passivate (100) facets of halide‐capped large‐size CQDs, leading to suppressed bandtail states and reduced defect concentration. Our results demonstrate that the dark current density is highly suppressed by about an order of magnitude to 9.6 nA cm−2 at −10 mV, which is among the lowest reported for PbS CQD photodiodes. Furthermore, the performance of the photodiodes is exemplary, yielding an external quantum efficiency of 50.8% (which corresponds to a responsivity of 0.532 A W−1) and a specific detectivity of 2.5 × 1012 Jones at 1300 nm. By integrating CQD photodiodes with CMOS ROICs, the CQD imager provides high‐resolution (640 × 512) SWIR imaging for infrared penetration and material discrimination.