Effect of Plasma Treatment on the Luminescent and Scintillation Properties of Thick ZnO Films Fabricated by Sputtering of a Hot Ceramic Target
Andrey P. Tarasov,
Abubakar M. Ismailov,
Makhach Kh. Gadzhiev,
Ivan D. Venevtsev,
Arsen E. Muslimov,
Ivan S. Volchkov,
Samira R. Aidamirova,
Alexandr S. Tyuftyaev,
Andrey V. Butashin,
Vladimir M. Kanevsky
Affiliations
Andrey P. Tarasov
Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics”, Russian Academy of Sciences, 119333 Moscow, Russia
Abubakar M. Ismailov
Department of Physics, Dagestan State University, 367000 Makhachkala, Russia
Makhach Kh. Gadzhiev
Joint Institute for High Temperatures, Russian Academy of Sciences, 125412 Moscow, Russia
Ivan D. Venevtsev
Department of Physics, Peter the Great St. Petersburg Polytechnic University, 195251 St. Petersburg, Russia
Arsen E. Muslimov
Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics”, Russian Academy of Sciences, 119333 Moscow, Russia
Ivan S. Volchkov
Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics”, Russian Academy of Sciences, 119333 Moscow, Russia
Samira R. Aidamirova
Department of Physics, Dagestan State University, 367000 Makhachkala, Russia
Alexandr S. Tyuftyaev
Joint Institute for High Temperatures, Russian Academy of Sciences, 125412 Moscow, Russia
Andrey V. Butashin
Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics”, Russian Academy of Sciences, 119333 Moscow, Russia
Vladimir M. Kanevsky
Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics”, Russian Academy of Sciences, 119333 Moscow, Russia
The paper presents the results of a comprehensive study of the structural-phase composition, morphology, optical, luminescent, and scintillation characteristics of thick ZnO films fabricated by magnetron sputtering. By using a hot ceramic target, extremely rapid growth (~50 µm/h) of ZnO microfilms more than 100 µm thick was performed, which is an advantage for the industrial production of scintillation detectors. The effects of post-growth treatment of the fabricated films in low-temperature plasma were studied and a significant improvement in their crystalline and optical quality was shown. As a result, the films exhibit intense near-band-edge luminescence in the near-UV region with a decay time of 550 nm) green-yellow emission originates mainly from bulk parts of the films.
