Advanced Electronic Materials (Feb 2024)

Reliable Accessibility of Intermediate Polarization States in Textured Ferroelectric Al0.66Sc0.34N Thin Film

  • Tae Yoon Lee,
  • Myeong Seop Song,
  • Jung Woo Cho,
  • In Hyeok Choi,
  • Chihwan An,
  • Jong Seok Lee,
  • Seung Chul Chae

DOI
https://doi.org/10.1002/aelm.202300591
Journal volume & issue
Vol. 10, no. 2
pp. n/a – n/a

Abstract

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Abstract Ferroelectric materials are promising candidates for neuromorphic computing synaptic devices due to the nonvolatile multiplicity of spontaneous polarization. To ensure a sufficient memory window, ferroelectric materials with a large coercivity are urgently required for practical applications in highly scaled multi‐bit memory devices. Herein, a remarkable reliability of intermediate ferroelectric polarization states is demonstrated in a textured Al0.66Sc0.34N thin film with a coercive field of 2.4 MV cm−1. Al0.66Sc0.34N thin films are prepared at 300 °C on Pt (111)/Ti/SiO2/Si substrates using a radio frequency reactive sputtering method. Al0.66Sc0.34N thin films exhibit viable ferroelectricity with a large remanent polarization value of >100 µC cm−2. Through the conventional current–voltage characteristics, polarization switching kinetics, and temperature dependence of coercivity, the reproducibility of multiple polarization states with apparent accuracy is attributed to a small critical volume (3.7 × 10−28 m3) and a large activation energy (3.3 × 1027 eV m−3) for nucleation of the ferroelectric domain. This study demonstrates the potential of ferroelectric Al1‐xScxN for synaptic weight elements in neural network hardware.

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