On the reproducibility of electron-beam lithographic fabrication of photonic nanostructures

Abstract

Abstract Photonic nanostructures such as gratings and ring resonators have become ubiquitous building blocks in Photonics. For example, they are used in filters, they resonantly enhance signals and act as grating couplers. Much research effort is invested in using such structures to create novel functionalities, which often employs electron-beam lithography. An intrinsic issue in this field is the ability to accurately achieve a specific operating wavelength, especially for resonant systems, because nanometer-scale variations in feature size may easily detune the device. Here, we examine some of the key fabrication steps and show how to improve the reproducibility of fabricating wavelength scale photonic nanostructures. We use guided mode resonance grating sensors as our exemplar and find that the exposure condition and the development process significantly affect the consistency of the resonance wavelength, amplitude, and sensitivity of the sensor. By having careful control over these factors, we can achieve consistent performance for all the sensors studied, with less than 10% variation in their resonance behaviors. These investigations provide useful guidelines for fabricating nanostructures more reliably and to achieve a higher success rate in exploratory experiments.