Materials (Jul 2022)

Applied IrO<sub>2</sub> Buffer Layer as a Great Promoter on Ti-Doping V<sub>2</sub>O<sub>5</sub> Electrode to Enhance Electrochromic Device Properties

  • Tien-Fu Ko,
  • Po-Wen Chen,
  • Kuan-Ming Li,
  • Hong-Tsu Young

DOI
https://doi.org/10.3390/ma15155179
Journal volume & issue
Vol. 15, no. 15
p. 5179

Abstract

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Electrochromic devices (ECDs) are a promising material for smart windows that are capable of transmittance variation. However, ECDs are still too expensive to achieve a wide market reach. Reducing fabrication cost remains a challenge. In this study, we inserted an IrO2 buffer layer on Ti-doped V2O5 (Ti:V2O5) as a counter electrode using various Ar/O2 gas flow ratios (1/2, 1/2.5, 1/3 and 1/3.5) in the fabrication process. The buffered-ECD resulted in a larger cyclic voltammetry (CV) area and the best surface average roughness (Ra = 3.91 nm) to promote electrochromic performance. It was fabricated using the low-cost, fast deposition process of vacuum cathodic arc plasma (CAP). This study investigates the influence of the IrO2 buffer/Ti:V2O5 electrode on ECD electrochemical and optical properties, in terms of color efficiency (CE) and cycle durability. The buffered ECD (glass/ITO/WO3/liquid electrolyte/IrO2 buffer/Ti:V2O5/ITO/glass) demonstrated excellent optical transmittance modulation; ∆T = 57% (from Tbleaching (67%) to Tcoloring (10%)) at 633 nm, which was higher than without the buffer (ITO/WO3/liquid electrolyte/Ti:V2O5/ITO) (∆T = 36%). In addition, by means of an IrO2 buffer, the ECD exhibited high coloration efficiency of 96.1 cm2/mC and good durability, which decayed by only 2% after 1000 cycles.

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