AIP Advances (Jun 2011)

Ni induced few-layer graphene growth at low temperature by pulsed laser deposition

  • K. Wang,
  • G. Tai,
  • K. H. Wong,
  • S. P. Lau,
  • W. Guo

DOI
https://doi.org/10.1063/1.3602855
Journal volume & issue
Vol. 1, no. 2
pp. 022141 – 022141-9

Abstract

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We have used pulsed laser deposition to fabricate graphene on catalytic nickel thin film at reduced temperature of 650 °C. Non-destructive micro-Raman spectroscopic study on our samples, measuring 1x1 cm2 each, has revealed few-layer graphene formation. Bi-, tri-, and few-layer graphene growth has been verified by High Resolution Transmission Electron Microscopy. Our experimental results imply that the number of graphene layers formation relies on film thickness ratios of C to Ni, which can be well controlled by varying the laser ablation time. This simple and low temperature synthesizing method is excellent for graphene based nanotechnology research and device fabrication.