High temperature resistance of silicide-coated niobium

Abstract

In this paper, thermal oxidation resistance of silicide-coated niobium substrates was tested in a temperature range of 1300–1450°C using an HVOF burner. Pure niobium specimens were coated using the pack cementation CVD method. Three different silicide thickness coatings were deposited. Thermal oxidation resistance of the coated niobium substrates was tested in a temperature range of 1300–1450°C using an HVOF burner. All samples that passed the test showed their ability to stabilize the temperature over a time of 30 s during the thermal test. The rise time of substrate temperature takes about 10 s, following which it keeps constant values. In order to assess the quality of the Nb-Si coatings before and after the thermal test, light microscopy, scanning electron microscopy (SEM) along with chemical analysis (EDS), X-ray diffraction XRD and Vickers hardness test investigation were performed. Results confirmed the presence of substrate Nb compounds as well as Si addition. The oxygen compounds are a result of high temperature intense oxidizing environment that causes the generation of SiO phase in the form of quartz and cristobalite during thermal testing. Except for one specimen, all substrate surfaces pass the high temperature oxidation test with no damages.

Keywords

• niobium
• silicide
• thermal barrier coating
• cvd
• high temperature oxidation resistance