High Power Sunlight‐Simulated UV‐Induced Radical Polymerization: Self‐Initiation and Self‐Crosslinking

Abstract

Abstract Under high power UV irradiation, radicals can be generated from double bonds through photodissociation, H‐abstraction, or oxygen initiation mechanisms. This eliminates the need for externally added initiators in photopolymerization. This study investigates high‐power sunlight‐simulated UV‐induced free radical polymerization under various experimental conditions, including the presence of inhibitors, open or closed systems, and partial degassing. Additionally, high‐power sunlight‐simulated UV‐induced atom transfer radical polymerization is explored by externally adding CuBr2/ligand (1:2) catalyst at 100 or 1000 ppm molar concentration of copper. Delicate fabrication of real‐world thin films, coatings, and delicate 3D composites further demonstrates the high reliability and versatility of this technology.

Keywords

• atom transfer radical polymerization
• free radical polymerization
• high power UV
• polymeric materials
• thin films