Confinement Effect of Plasmon for the Fabrication of Interconnected AuNPs through the Reduction of Diazonium Salts
Luong-Lam Nguyen,
Quang-Hai Le,
Van-Nhat Pham,
Mathieu Bastide,
Sarra Gam-Derouich,
Van-Quynh Nguyen,
Jean-Christophe Lacroix
Affiliations
Luong-Lam Nguyen
Department of Advanced Materials Science and Nanotechnology, University of Science and Technology of Hanoi (USTH), Vietnam Academy Science and Technology, 18 Hoang Quoc Viet, Cau Giay, Hanoi 100000, Vietnam
Quang-Hai Le
Department of Advanced Materials Science and Nanotechnology, University of Science and Technology of Hanoi (USTH), Vietnam Academy Science and Technology, 18 Hoang Quoc Viet, Cau Giay, Hanoi 100000, Vietnam
Van-Nhat Pham
Department of Advanced Materials Science and Nanotechnology, University of Science and Technology of Hanoi (USTH), Vietnam Academy Science and Technology, 18 Hoang Quoc Viet, Cau Giay, Hanoi 100000, Vietnam
Mathieu Bastide
Chemistry Department, Université de Paris, ITODYS, UMR 7086 CNRS, 15 Rue Jean-Antoine de Baïf, CEDEX 13, 75205 Paris, France
Sarra Gam-Derouich
Chemistry Department, Université de Paris, ITODYS, UMR 7086 CNRS, 15 Rue Jean-Antoine de Baïf, CEDEX 13, 75205 Paris, France
Van-Quynh Nguyen
Department of Advanced Materials Science and Nanotechnology, University of Science and Technology of Hanoi (USTH), Vietnam Academy Science and Technology, 18 Hoang Quoc Viet, Cau Giay, Hanoi 100000, Vietnam
Jean-Christophe Lacroix
Department of Advanced Materials Science and Nanotechnology, University of Science and Technology of Hanoi (USTH), Vietnam Academy Science and Technology, 18 Hoang Quoc Viet, Cau Giay, Hanoi 100000, Vietnam
This paper describes a rapid bottom-up approach to selectively functionalize gold nanoparticles (AuNPs) on an indium tin oxide (ITO) substrate using the plasmon confinement effect. The plasmonic substrates based on a AuNP-free surfactant were fabricated by electrochemical deposition. Using this bottom-up technique, many sub-30 nm spatial gaps between the deposited AuNPs were randomly generated on the ITO substrate, which is difficult to obtain with a top-down approach (i.e., E-beam lithography) due to its fabrication limits. The 4-Aminodiphenyl (ADP) molecules were grafted directly onto the AuNPs through a plasmon-induced reduction of the 4-Aminodiphenyl diazonium salts (ADPD). The ADP organic layer preferentially grew in the narrow gaps between the many adjacent AuNPs to create interconnected AuNPs. This novel strategy opens up an efficient technique for the localized surface modification at the nanoscale over a macroscopic area, which is anticipated to be an advanced nanofabrication technique.
