Applied Microscopy (Dec 2019)

Electron beam irradiation induced crystallization behavior of amorphous Ge2Sb2Te5 chalcogenide material

  • Byeong-Seon An

DOI
https://doi.org/10.1186/s42649-019-0021-5
Journal volume & issue
Vol. 49, no. 1
pp. 1 – 2

Abstract

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Abstract The crystallization of amorphous Ge2Sb2Te5 phase change material induced by electron beam irradiation was investigated by in-situ transmission electron microscopy (TEM). Amorphous matrix transformed into a partially crystalline state after being irradiated with a 200-keV electron beam for a long time. Real-time observation revealed that the crystallization of amorphous Ge2Sb2Te5 film occurs through a nucleation and growth mechanism under electron beam irradiation in TEM. While uncertainty from the 2D projection remains, the nuclei have been observed to grow preferentially along the direction.

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