Effect of Annealing and Thickness of Co<sub>40</sub>Fe<sub>40</sub>Yb<sub>20</sub> Thin Films on Various Physical Properties on a Glass Substrate
Wen-Jen Liu,
Yung-Huang Chang,
Chia-Chin Chiang,
Chi-Lon Fern,
Yuan-Tsung Chen,
Ying-Hsuan Chen,
Hao-Wen Liao,
Te-Ho Wu,
Shih-Hung Lin,
Ko-Wei Lin,
Po-Wei Chi
Affiliations
Wen-Jen Liu
Department of Materials Science and Engineering, I-Shou University, Kaohsiung 84001, Taiwan
Yung-Huang Chang
Bachelor Program in Interdisciplinary Studies, National Yunlin University of Science and Technology, 123 University Road, Section 3, Douliou 64002, Taiwan
Chia-Chin Chiang
Department of Mechanical Engineering, National Kaohsiung University of Science and Technology, 415 Chien Kung Road, Kaohsiung 80778, Taiwan
Chi-Lon Fern
Department of Materials Science and Engineering, National Chung Hsing University, Taichung 40227, Taiwan
Yuan-Tsung Chen
Graduate School of Materials Science, National Yunlin University of Science and Technology, 123 University Road, Section 3, Douliou 64002, Taiwan
Ying-Hsuan Chen
Graduate School of Materials Science, National Yunlin University of Science and Technology, 123 University Road, Section 3, Douliou 64002, Taiwan
Hao-Wen Liao
Graduate School of Materials Science, National Yunlin University of Science and Technology, 123 University Road, Section 3, Douliou 64002, Taiwan
Te-Ho Wu
Graduate School of Materials Science, National Yunlin University of Science and Technology, 123 University Road, Section 3, Douliou 64002, Taiwan
Shih-Hung Lin
Department of Electronic Engineering, National Yunlin University of Science and Technology, 123 University Road, Section 3, Douliou 64002, Taiwan
Ko-Wei Lin
Department of Materials Science and Engineering, National Chung Hsing University, Taichung 40227, Taiwan
Po-Wei Chi
Institute of Physics, Academia Sinica, Nankang, Taipei 11529, Taiwan
The aim of this work is to investigate the effect of annealing and thickness on various physical properties in Co40Fe40Yb20 thin films. X-ray diffraction (XRD) was used to determine the amorphous structure of Co40Fe40Yb20 films. The maximum surface energy of 40 nm thin films at 300 °C is 34.54 mJ/mm2. The transmittance and resistivity decreased significantly as annealing temperatures and thickness increased. At all conditions, the 10 nm film had the highest hardness. The average hardness decreased as thickness increased, as predicted by the Hall–Petch effect. The highest low-frequency alternative-current magnetic susceptibility (χac) value was discovered when the film was annealed at 200 °C with 50 nm, and the optimal resonance frequency (ƒres) was in the low frequency range, indicating that the film has good applicability in the low frequency range. At annealed 200 °C and 50 nm, the maximum saturation magnetization (Ms) was discovered. Thermal disturbance caused the Ms to decrease when the temperature was raised to 300 °C. The optimum process conditions determined in this study are 200 °C and 50 nm, with the highest Ms, χac, strong adhesion, and low resistivity, which are suitable for magnetic applications, based on magnetic properties and surface energy.
