Shining light on multi‐drug resistant Candida auris: Ultraviolet‐C disinfection, wavelength sensitivity, and prevention of biofilm formation of an emerging yeast pathogen

Abstract

Abstract Candida auris is an emerging fungal superbug of worldwide interest. It is associated with high mortality rates and exhibits increased resistance to antifungals. Ultraviolet subtype C (UVC) light can be used to disinfect surfaces to mitigate its spread. The objectives of this study were (1) To investigate UVC disinfection performances and wavelength sensitivity of C. auris. (2) To evaluate the UVC dose required for the prevention of biofilm formation on stainless‐steel, plastic (polystyrene), and poly‐cotton fabric surfaces. C. auris was grown following standard procedures. The study utilized six different UVC LED arrays with wavelengths between 252 and 280 nm. Arrays were set at similar intensities, to obtain doses of 5–40 mJ cm−2 and similar irradiation time. Disinfection performance for each array was determined using log reduction value (LRV) and percentage reduction by comparing the controls against the irradiated treatments. Evaluation of the ability of 267 nm UVC LEDs to prevent C. auris biofilm formation was investigated using stainless‐steel, plastic coupons, and poly‐cotton fabric. Peak sensitivity to UVC disinfection was between 267 and 270 nm. With 20 mJ cm−2, the study obtained ≥LRV3. On stainless‐steel coupons, 30 mJ cm−2 was sufficient to prevent biofilm formation, while on plastic, this required 10 mJ cm−2. A dose of 60 mJ cm−2 reduced biofilms on poly‐cotton fabric significantly (R2 = 0.9750, p = 0.0002). The study may allow for the design and implementation of disinfection systems.

Keywords

• antibiotic resistance
• biofilm prevention
• Candida auris
• inactivation
• UVC LED
• yeasticidal