The paper proposes a technology based on UV-LIGA process for microoptoelectromechanical systems (MOEMS) manufacturing. We used the original combination of materials and technological steps, in which any of the materials does not enter chemical reactions with each other, while all of them are weakly sensitive to the effects of oxygen plasma. This made it suitable for long-term etching in the oxygen plasma at low discharge power with the complete preservation of the original geometry, including small parts. The micromembranes were formed by thermal evaporation of Al. This simplified the technique compared to the classic UV-LIGA and guaranteed high quality and uniformity of the resulting structure. To demonstrate the complete process, a test MOEMS with electrostatic control was manufactured. On one chip, a set of micromembranes was created with different stiffness from 10 nm/V to 100 nm/V and various working ranges from 100 to 300 nm. All membranes have a flat frequency response without resonant peaks in the frequency range 0–200 kHz. The proposed technology potentially enables the manufacture of wide low-height membranes of complex geometry to create microoptic fiber sensors.
