Patterning luminescent and stable perovskite-acrylic polymer composites via a convenient strategy

Abstract

Perovskite semiconductors have achieved great success during the last decades in the application of solar cells, light-emitting diodes, and photodiodes. Developing strategies to pattern perovskites with high-resolution is crucial to broaden the application scenarios of perovskite displays and on-chip lighting. However, the widely used lithography procedure has the problem of high-cost and complexity. In this study, we demonstrate a method to pattern a luminescent perovskite-acrylic polymer composite that is prepared by direct injection at room temperature. This strategy uses standard photoresists and UV lithography at room temperature, and then the pattern in the photoresists can be easily transferred to the perovskite-acrylic polymer composite. Finally, we can obtain high-quality micron-scale features. Furthermore, we demonstrate the universality of this strategy by adapting perovskite with different color emissions into the composite and patterning it using the same procedure. Another advantage of this patternable perovskite-acrylic polymer composite is its superb water-repellent properties, which are believed to be of great potential in underwater applications.