Fabrication and evaluation of Ta2O5:Y2O3 co-sputtered thin films

Abstract

Co-sputtered tantalum (V) oxide and yttrium (III) oxide (Ta2O5:Y2O3) thin films were fabricated using radio-frequency magnetron sputtering for the first time, and their photoluminescence (PL) and X-ray diffraction properties were evaluated. Broad PL spectra from 380 to 800 nm were observed only from films annealed at 700 °C. The maximum PL intensities were found around a wavelength of 500 nm regardless of the Y concentrations of the films, and the films annealed at 700 °C were primarily amorphous phases. It seems that the broad PL spectra from the Ta2O5:Y2O3 films originated from oxygen vacancies of Ta2O5 and Y2O3 particles that may be produced in Ta2O5 by co-sputtering.

Keywords

• Tantalum oxide
• Yttrium oxide
• Co-sputtering
• Annealing
• Photoluminescence