Applied Physics Express (Jan 2024)

Heavy electron doping in monolayer MoS2 on a freestanding N-face GaN substrate

  • Kaipeng Rong,
  • Keisuke Shinokita,
  • Peishan Yu,
  • Takahiko Endo,
  • Tsutomu Araki,
  • Yasumitsu Miyata,
  • Kazunari Matsuda,
  • Shinichiro Mouri

DOI
https://doi.org/10.35848/1882-0786/ad8c9b
Journal volume & issue
Vol. 17, no. 11
p. 115002

Abstract

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This study explores how gallium nitride (GaN) surface polarity affects the optical properties and surface potential of MoS _2 . Using Raman spectroscopy, photoluminescence, and Kelvin force microscopy (KFM), significant electron doping (∼10 ^14 cm ^−2 ) was observed in MoS _2 on N-face GaN compared to Ga-face. photoluminescence spectra and the small contact potential difference of ∼30 mV measured by KFM provided evidence for polarity-dependent different doping levels. Additionally, KFM measurements also suggested a small band bending difference between Ga- and N-face GaN, likely due to interactions at the GaN/MoS _2 interface. This heavy doping contributes to the improved valley polarization of N-face GaN.

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