In-Situ Photo-Dissociation and Polymerization of Carbon Disulfide with Vacuum Ultraviolet Microplasma Flat Lamp for Organic Thin Films

Abstract

Vacuum UV (VUV) photo-dissociation for a liquid phase organic compound, carbon disulfide (CS2), has been investigated. 172 nm (7.2 eV) VUV photons from Xe2* excimers in a microcavity plasma lamp irradiated free-standing liquid droplets on Si substrate in each a nitrogen environment and an atmospheric air environment. Selective and rapid dissociation of CS2 into C-C, C-S or C-O-S based fragments was observed in the different gas environments during the reaction. Thin-layered polymeric microdeposites have been identified by characterization with a Scanning electron microscope (SEM), Energy dispersive x-ray spectroscopy (EDX), Raman spectroscopy and X-ray photoelectron spectroscopy (XPS). This novel photo-process from the flat VUV microplasma lamp introduces another pathway of low-temperature organic (or synthetic) conversion for large area deposition. The in-situ, selective conversion of various organic precursors can be potentially used in optoelectronics and nanotechnology applications.

Keywords

• carbon disulfide
• microplasma
• photo-dissociation
• polymerization
• 172 nm VUV lamp