Development of Modified Farquhar–von Caemmerer–Berry Model Describing Photodamage of Photosynthetic Electron Transport in C₃ Plants under Different Temperatures

Abstract

Photodamage of photosynthetic electron transport is a key mechanism of disruption of photosynthesis in plants under action of stressors. This means that investigation of photodamage is an important task for basic and applied investigations. However, its complex mechanisms restrict using experimental methods of investigation for this process; the development of mathematical models of photodamage and model-based analysis can be used for overcoming these restrictions. In the current work, we developed the modified Farquhar–von Caemmerer–Berry model which describes photodamage of photosynthetic electron transport in C3 plants. This model was parameterized on the basis of experimental results (using an example of pea plants). Analysis of the model showed that combined inactivation of linear electron flow and Rubisco could induce both increasing and decreasing photodamage at different magnitudes of inactivation of these processes. Simulation of photodamage under different temperatures and light intensities showed that simulated temperature dependences could be multi-phase; particularly, paradoxical increases in the thermal tolerance of photosynthetic electron transport could be observed under high temperatures (37–42 °C). Finally, it was shown that changes in temperature optimums of linear electron flow and Rubisco could modify temperature dependences of the final activity of photosynthetic electron transport under photodamage induction; however, these changes mainly stimulated its photodamage. Thus, our work provides a new theoretical tool for investigation of photodamage of photosynthetic processes in C3 plants and shows that this photodamage can be intricately dependent on parameters of changes in activities of linear electron flow and Rubisco including changes induced by temperature.

Keywords

• photosynthesis
• Farquhar–von Caemmerer–Berry model
• photodamage
• temperature dependences
• thermal tolerance