3D electron-beam writing at sub-15 nm resolution using spider silk as a resist

Abstract

Electron beam lithography (EBL) is renowned to provide fabrication resolution in the deep nanometer scale but their incapability of arbitrary 3D nanofabrication poses a major limitation to the technique. Here, the authors demonstrate a manufacturing technique of functional 3d nanostructures at a resolution of sub-15 nm using voltage-regulated 3d EBL.