AIP Advances (Feb 2018)

Direct bandgap type-I GeSn/GeSn quantum well on a GeSn- and Ge- buffered Si substrate

  • Perry C. Grant,
  • Joe Margetis,
  • Yiyin Zhou,
  • Wei Dou,
  • Grey Abernathy,
  • Andrian Kuchuk,
  • Wei Du,
  • Baohua Li,
  • John Tolle,
  • Jifeng Liu,
  • Greg Sun,
  • Richard A. Soref,
  • Mansour Mortazavi,
  • Shui-Qing Yu

DOI
https://doi.org/10.1063/1.5020035
Journal volume & issue
Vol. 8, no. 2
pp. 025104 – 025104-7

Abstract

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This paper reports the comprehensive characterization of a Ge0.92Sn0.08/Ge0.86Sn0.14/Ge0.92Sn0.08 single quantum well. By using a strain relaxed Ge0.92Sn0.08 buffer, the direct bandgap Ge0.86Sn0.14 QW was achieved, which is unattainable by using only a Ge buffer. Band structure calculations and optical transition analysis revealed that the quantum well features type-I band alignment. The photoluminescence spectra showed dramatically increased quantum well peak intensity at lower temperature, confirming that the Ge0.86Sn0.14 quantum well is a direct bandgap material.