Edge beads removal in a photolithography process through a polymer mold

Abstract

In this paper, a new approach for achieving a higher uniformity while spinning photoresist is presented. The proposed method allows to overcome the well-known problem of the edge beads formation, which shows either with circular, small or irregular samples. The method consists in the fabrication of an elastomeric mold for housing the substrate, to obtain an equivalent uniformly planar and round surface. After the spin-coating, it is possible to pull out the coated sample from the mold and use it in a standard optical lithography process as well in any technological process. Moreover, the mold can be reused if the sample requires different lithographic processes.

Keywords

• photolithography
• soft lithography
• edge bead remover
• photoresist