Cleaning interfaces in layered materials heterostructures

D. G. Purdie; N. M. Pugno; T. Taniguchi; K. Watanabe; A. C. Ferrari; A. Lombardo

doi:10.1038/s41467-018-07558-3

Nature Communications (Dec 2018)

Cleaning interfaces in layered materials heterostructures

D. G. Purdie,
N. M. Pugno,
T. Taniguchi,
K. Watanabe,
A. C. Ferrari,
A. Lombardo

Affiliations

D. G. Purdie: Cambridge Graphene Centre, University of Cambridge
N. M. Pugno: Laboratory of Bio-inspired and Graphene Nanomechanics, Department of Civil, Environmental and Mechanical Engineering, University of Trento
T. Taniguchi: National Institute for Materials Science
K. Watanabe: National Institute for Materials Science
A. C. Ferrari: Cambridge Graphene Centre, University of Cambridge
A. Lombardo: Cambridge Graphene Centre, University of Cambridge

DOI: https://doi.org/10.1038/s41467-018-07558-3
Journal volume & issue: Vol. 9, no. 1
pp. 1 – 12

Abstract

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Atomically-clean interfaces are required in heterostructures. Here, authors report a method for fast and parallel removal of contaminants from fully-formed heterostructures, including sample intentionally exposed to polymers and solvent, achieving room temperature mobility over 180,000 cm2/Vs for graphene.

Published in Nature Communications

ISSN: 2041-1723 (Online)
Publisher: Nature Portfolio
Country of publisher: United Kingdom
LCC subjects: Science
Website: https://www.nature.com/ncomms/

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