Nature Communications (Jun 2019)
Realization of wafer-scale nanogratings with sub-50 nm period through vacancy epitaxy
- Qiushi Huang,
- Qi jia,
- Jiangtao Feng,
- Hao Huang,
- Xiaowei Yang,
- Joerg Grenzer,
- Kai Huang,
- Shibing Zhang,
- Jiajie Lin,
- Hongyan Zhou,
- Tiangui You,
- Wenjie Yu,
- Stefan Facsko,
- Philippe Jonnard,
- Meiyi Wu,
- Angelo Giglia,
- Zhong Zhang,
- Zhi Liu,
- Zhanshan Wang,
- Xi Wang,
- Xin Ou
Affiliations
- Qiushi Huang
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences
- Qi jia
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences
- Jiangtao Feng
- Key Laboratory of Advanced Micro-Structured Materials MOE, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University
- Hao Huang
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences
- Xiaowei Yang
- Key Laboratory of Advanced Micro-Structured Materials MOE, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University
- Joerg Grenzer
- Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, Bautzner Landstrasse 400
- Kai Huang
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences
- Shibing Zhang
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences
- Jiajie Lin
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences
- Hongyan Zhou
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences
- Tiangui You
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences
- Wenjie Yu
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences
- Stefan Facsko
- Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, Bautzner Landstrasse 400
- Philippe Jonnard
- Sorbonne Université, Faculté des Sciences et Ingénierie, UMR CNRS, Laboratoire de Chimie Physique – Matière et Rayonnement, boîte courrier 1140
- Meiyi Wu
- Sorbonne Université, Faculté des Sciences et Ingénierie, UMR CNRS, Laboratoire de Chimie Physique – Matière et Rayonnement, boîte courrier 1140
- Angelo Giglia
- CNR Istituto Officina Materiali
- Zhong Zhang
- Key Laboratory of Advanced Micro-Structured Materials MOE, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University
- Zhi Liu
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences
- Zhanshan Wang
- Key Laboratory of Advanced Micro-Structured Materials MOE, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University
- Xi Wang
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences
- Xin Ou
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences
- DOI
- https://doi.org/10.1038/s41467-019-10095-2
- Journal volume & issue
-
Vol. 10,
no. 1
pp. 1 – 9
Abstract
Fabrication of wafer-scale nanogratings for X-ray spectroscopy is difficult especially for very high line densities. The authors use vacancy epitaxy to fabricate sub-50-nm-periodicity gratings, coated with multilayers for efficient operation, for use in ultra-high resolution x-ray spectroscopy.
